Through our in-house R&D efforts, Interserv Technology successfully pioneered new technology to meet the National Technology Roadmap for Semiconductor Manufacturing.  The MT300 was the first machine of its kind to predictably and repeatably create dense arrays of 0.18µm of lines and circles in 0.8µm photoresist.  It utilizes coherent optical beams to form high spatial frequency patterns with essentially unlimited depth-of-field.  The I-line photoresist is exposed using a 365nm laser source with a bottom anti-reflection coating.  This pioneering technology was demonstrated and proven in over three years of production, and has led to other development contracts in support of the Technology Roadmap.

For further information, please contact our sales department.