FPD Alignment & Assembly Systems Specifications

SUBSTRATE DIMENSIONS

  • Substrate Size: Variable up to 700 mm x 650 mm using an interchangeable substrate tooling set

  • Each system is equipped standard with one substrate tooling set; additional substrate sizes are optional

  • Standard Substrate Thickness:

    1.1 mm, ±100 µm (microns)

    0.7 mm, ±100 µm (microns)

  • Other substrate thicknesses optional

Substrate Alignment Stage

  • Range:

    • X: ±1.5 mm

    • Y: ±1.5 mm

    • Z: 400 µm

  • Resolution (x, y): 0.2 µm

  • Degrees of Freedom: 6 (x, y, z, pitch, roll, theta)

Interserv Technology - Alignment Repeatability

Interserv Technology - Target Video ImageInterserv Technology - Digitized Target Image

Coarse/Fine Alignment

  • Substrate separation during coarse alignment: 50-400 µm

  • Coarse Alignment Accuracy: ±6.0 µm

  • Substrate separation during fine alignment: <30 µm 

    (determined by spacer thickness)

  • Fine Alignment Accuracy: ±3.0 µm

  • Alignment Target Capture Range: ±500 µm

  • Alignment Method: Computer analysis of digitized and filtered video images of alignment targets located on both substrates

  • Alignment Algorithm: Least squares fit of three measurement points on the substrates to minimize the effect of plate runout

  • Display: Real time on screen display of the three sets of alignment targets

  • Microscope positions are changeable for various plate sizes

Substrate Pressing Mechanism

  • Method: Air pressure applied to the top of the substrate assembly generates a highly uniform force distribution for pressing

  • Alignment: Continuous alignment during pressing of substrates to prevent alignment creep

  • Pressure Control: Computerized closed-loop control of applied pressure ensures process consistency; pressure setting can be continuously monitored and easily changed

  • Pressure Range: 0.25 to 5 psi

  • Pressure Resolution: 0.1 psi

Glue Curing

  • Standard Method: UV-type flood expose

  • Optional Method: Tacking at predefined locations via fiber optics from UV light source

  • Peak Wavelength: 365 nm

  • Bandwidth: 310-450 nm

  • Irradiance of Flood Expose System: 50 mW/cm2

  • Irradiance of Optional Fiber Optic Exposure System: up to 20,000 mW/cm2

Operation

  • Operation is semi-automatic as a stand alone system, or fully automatic in-line as part of a cluster tool

  • Computer: Industrial Pentium® PC

  • Operator Interface: Windows® based Graphical User Interface (GUI) with control and status screens and real-time system diagnostics

  • GUI to Factory Host Computer or Production Line Robots: RS-232, Ethernet, or USB

  • On-Line Support: HTML Help Screens (Clicking on features in question will initiate an automatic search and display the explanation)

General

  • Footprint: 1400 mm (w) x 900 mm (d) x 1600 mm (l)

    (Typical for 400 mm x 400 mm substrate size)

    (Machine dimensions are subject to change with system configuration)

  • Clean, Dry Air Source: 12 scfm at 95-110 psi

  • UV Exposure Power Source: 110 VAC, 30 A, 60Hz

  • System Power Source: 110 VAC, 30 A, 60Hz

*Specifications and system configuration are subject to change without notice.